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Method and apparatus for post exposure processing of photoresist wafers |
Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Daniel J. Woodruff +2 more |
2019-11-12 |
| 10475655 |
Selective deposition of metal silicides |
Raymond Hung, Namsung Kim, Ellie Yieh, Jong Hun Choi, Christopher Ahles +1 more |
2019-11-12 |
| 10438849 |
Microwave anneal to improve CVD metal gap-fill and throughput |
He Ren, Jie Zhou, Guannan Chen, Michael W. Stowell, Bencherki Mebarki +3 more |
2019-10-08 |
| 10431427 |
Monopole antenna array source with phase shifted zones for semiconductor process equipment |
Qiwei Liang |
2019-10-01 |
| 10429747 |
Hybrid laser and implant treatment for overlay error correction |
Mangesh Ashok BANGAR, Steve Ghanayem, Ellie Yieh |
2019-10-01 |
| 10358715 |
Integrated cluster tool for selective area deposition |
Tobin Kaufman-Osborn, Ludovic Godet, Qiwei Liang, Adib Khan |
2019-07-23 |
| 10347516 |
Substrate transfer chamber |
Sriskantharajah Thirunavukarasu, Eng Sheng Peh, Arvind Sundarrajan, Avinash Avula, Ellie Yieh |
2019-07-09 |
| 10297441 |
Low-temperature atomic layer deposition of boron nitride and BN structures |
Steven Wolf, Mary Edmonds, Andrew C. Kummel, Ellie Yieh |
2019-05-21 |
| 10269571 |
Methods for fabricating nanowire for semiconductor applications |
Keith Tatseun Wong, Shiyu Sun, Sean S. Kang, Nam Sung Kim, Ellie Yieh |
2019-04-23 |
| 10249495 |
Diamond like carbon layer formed by an electron beam plasma process |
Yang Yang, Lucy Chen, Jie Zhou, Kartik Ramaswamy, Kenneth S. Collins +5 more |
2019-04-02 |
| 10240232 |
Gas control in process chamber |
Qiwei Liang, Ellie Yieh |
2019-03-26 |
| 10233547 |
Methods of etching films with reduced surface roughness |
Benjamin Schmiege, Nitin K. Ingle, Jeffrey W. Anthis, Xikun Wang, Jie Liu +1 more |
2019-03-19 |
| 10224224 |
High pressure wafer processing systems and related methods |
Qiwei Liang, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik, Sean S. Kang +1 more |
2019-03-05 |
| 10203604 |
Method and apparatus for post exposure processing of photoresist wafers |
Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Daniel J. Woodruff +2 more |
2019-02-12 |
| 10179941 |
Gas delivery system for high pressure processing chamber |
Adib Khan, Qiwei Liang, Sultan Malik, Keith Tatseun Wong |
2019-01-15 |
