Issued Patents 2019
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10475693 | Method for forming single diffusion breaks between finFET devices and the resulting devices | Jiehui Shu, Hong Yu, Hui Zang | 2019-11-12 |
| 10453936 | Methods of forming replacement gate structures on transistor devices | Jiehui Shu, Chang Seo Park, Shimpei Yamaguchi, Tao Han, Yong Yang +1 more | 2019-10-22 |
| 10446395 | Self-aligned multiple patterning processes with layered mandrels | Jiehui Shu, Xiaohan Wang, Qiang Fang, Zhiguo Sun, Hui Zang | 2019-10-15 |
| 10431665 | Multiple-layer spacers for field-effect transistors | Tao Han, Zhenyu Hu, Hsien-Ching Lo, Jianwei Peng | 2019-10-01 |
| 10431500 | Multi-step insulator formation in trenches to avoid seams in insulators | Asli Sirman, Jiehui Shu, Chih-Chiang Chang, Huy Cao, Haigou Huang | 2019-10-01 |
| 10418272 | Methods, apparatus, and system for a semiconductor device comprising gates with short heights | Jiehui Shu, Garo Derderian, Hui Zang, John H. Zhang, Haigou Huang | 2019-09-17 |
| 10403742 | Field-effect transistors with fins formed by a damascene-like process | Wei Zhao, Haiting Wang, David Paul Brunco, Jiehui Shu, Shesh Mani Pandey +1 more | 2019-09-03 |
| 10361289 | Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same | Wei Zhao, Shahab Siddiqui, Haiting Wang, Ting-Hsiang Hung, Yiheng Xu +4 more | 2019-07-23 |
| 10347541 | Active gate contacts and method of fabrication thereof | Jiehui Shu, David Paul Brunco, Pei Liu, Shariq Siddiqui | 2019-07-09 |
| 10340142 | Methods, apparatus and system for self-aligned metal hard masks | Jinsheng Gao, Daniel Jaeger, Michael V. Aquilino, Patrick Carpenter, Jiehui Shu +1 more | 2019-07-02 |
| 10312150 | Protected trench isolation for fin-type field-effect transistors | Fuad H. Al-Amoody, Joseph K. Kassim, Bharat Krishnan | 2019-06-04 |
| 10279440 | Precision forming method of high-efficiency and near-net hollow valve blank of engine | Hongchao JI, Zhenghuan Hu, Baoyu Wang, Tao Zhang, Dongqiang Mo +4 more | 2019-05-07 |
| 10276683 | Common metal contact regions having different Schottky barrier heights and methods of manufacturing same | Tek Po Rinus Lee, Ruilong Xie | 2019-04-30 |
| 10276374 | Methods for forming fins | Jiehui Shu, Garo Derderian | 2019-04-30 |
| 10199265 | Variable space mandrel cut for self aligned double patterning | Jiehui Shu, Byoung Youp Kim | 2019-02-05 |
| 10192786 | Process for variable fin pitch and critical dimension | Hui Zang | 2019-01-29 |
| 10192791 | Semiconductor devices with robust low-k sidewall spacers and method for producing the same | Man Gu, Tao Han, Junsic Hong, Jiehui Shu, Asli Sirman +2 more | 2019-01-29 |
| 10192780 | Self-aligned multiple patterning processes using bi-layer mandrels and cuts formed with block masks | Xiaohan Wang, Jiehui Shu, Brendan O'Brien, Terry A. Spooner, Ravi Prakash Srivastava | 2019-01-29 |