Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522639 | Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device | Hui Zang, Daniel Jaeger, Haigou Huang, Veeraraghavan S. Basker, Christopher Nassar +1 more | 2019-12-31 |
| 10460986 | Cap structure | Jinsheng Gao, Daniel Jaeger, Chih-Chiang Chang, Patrick Carpenter, Junsic Hong +3 more | 2019-10-29 |
| 10453751 | Tone inversion method and structure for selective contact via patterning | Xiaofeng Qiu, Patrick Carpenter, Jessica Dechene, Ming Hao Tang, Haigou Huang +1 more | 2019-10-22 |
| 10418455 | Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device | Hui Zang, Daniel Jaeger, Haigou Huang, Veeraraghavan S. Basker, Christopher Nassar +1 more | 2019-09-17 |
| 10340142 | Methods, apparatus and system for self-aligned metal hard masks | Jinsheng Gao, Daniel Jaeger, Patrick Carpenter, Jiehui Shu, Pei Liu +1 more | 2019-07-02 |
| 10325819 | Methods, apparatus and system for providing a pre-RMG replacement metal contact for a finFET device | Jinsheng Gao, Daniel Jaeger, Patrick Carpenter, Jessica Dechene, Huy Cao +2 more | 2019-06-18 |
| 10269654 | Methods, apparatus and system for replacement contact for a finFET device | Jinsheng Gao, Daniel Jaeger, Patrick Carpenter, Jessica Dechene, Huy Cao +2 more | 2019-04-23 |
| 10204797 | Methods, apparatus, and system for reducing step height difference in semiconductor devices | Jinsheng Gao, Daniel Jaeger, Patrick Carpenter, Junsic Hong, Jessica Dechene +1 more | 2019-02-12 |
| 10177154 | Structure and method to prevent EPI short between trenches in FinFET eDRAM | Veeraraghavan S. Basker, Kangguo Cheng, Gregory Costrini, Ali Khakifirooz, Byeong Y. Kim +5 more | 2019-01-08 |