Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9823585 | EUV focus monitoring systems and methods | Chih-Tsung Shih, Chieh-Jen Cheng, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-11-21 |
| 9735065 | Systems and methods of local focus error compensation for semiconductor processes | Chia-Hao Hsu, Pei-Cheng Hsu, Chia-Ching Huang, Chih-Ming Chen | 2017-08-15 |
| 9665007 | Rotary EUV collector | Shang-Chieh Chien, Shu-Hao Chang, Jui-Ching Wu, Tsung-Yu Chen, Tzu-Hsiang Chen +2 more | 2017-05-30 |
| 9618856 | Method of overlay in extreme ultra-violet (EUV) lithography | Chia-Ching Huang, Chia-Hao Hsu | 2017-04-11 |
| 9612523 | Structure and method for reflective-type mask | Chih-Tsung Shih, Chi-Lun Lu, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-04-04 |
| 9607833 | System and method for photomask particle detection | Shang-Chieh Chien, Shu-Hao Chang, Hsiang-Yu Chou, Kuo-Chang Kau, Shun-Der Wu +1 more | 2017-03-28 |
| 9558944 | System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle | Chia-Hao Hsu, Jui-Ching Wu, Shang-Chieh Chien, Chia-Jen Chen, Chia-Ching Huang | 2017-01-31 |