Issued Patents 2017
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829785 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-11-28 |
| 9823585 | EUV focus monitoring systems and methods | Chih-Tsung Shih, Chieh-Jen Cheng, Jeng-Horng Chen, Chia-Chen Chen, Anthony Yen +1 more | 2017-11-21 |
| 9766536 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-09-19 |
| 9760015 | Extreme ultraviolet lithography process | Anthony Yen, Yen-Cheng Lu | 2017-09-12 |
| 9748133 | Via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-08-29 |
| 9733562 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-08-15 |
| 9728408 | Method of semiconductor integrated circuit fabrication | Chung-Ju Lee, Chih-Tsung Shih, Jeng-Horng Chen, Tsung-Min Huang, Anthony Yen | 2017-08-08 |
| 9726983 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-08-08 |
| 9709884 | EUV mask and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-07-18 |
| 9690186 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-06-27 |
| 9685367 | Photomask for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-06-20 |
| 9664999 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Jeng-Horng Chen +1 more | 2017-05-30 |
| 9640397 | Method of fabricating a semiconductor integrated circuit using a directed self-assembly block copolymer | Chieh-Han Wu, Chung-Ju Lee, Tien-I Bao, Tsung-Yu Chen, Yu-Fu Lin +1 more | 2017-05-02 |
| 9618837 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-04-11 |
| 9612531 | Method of fabricating an integrated circuit with enhanced defect repairability | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-04-04 |
| 9612523 | Structure and method for reflective-type mask | Chih-Tsung Shih, Chi-Lun Lu, Jeng-Horng Chen, Chia-Chen Chen, Anthony Yen +1 more | 2017-04-04 |
| 9588419 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-03-07 |
| 9575412 | Method and system for reducing pole imbalance by adjusting exposure intensity | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-02-21 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Jeng-Horng Chen +1 more | 2017-01-31 |
| 9557636 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Yen-Cheng Lu, Anthony Yen | 2017-01-31 |
| 9535334 | Extreme ultraviolet lithography process to print low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |