Issued Patents 2017
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829785 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-11-28 |
| 9760015 | Extreme ultraviolet lithography process | Shinn-Sheng Yu, Anthony Yen | 2017-09-12 |
| 9748133 | Via definition scheme | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-08-29 |
| 9733562 | Extreme ultraviolet lithography process and mask | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2017-08-15 |
| 9726983 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2017-08-08 |
| 9690186 | Extreme ultraviolet lithography process and mask | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2017-06-27 |
| 9685367 | Photomask for forming multiple layer patterns with a single exposure | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-06-20 |
| 9678431 | EUV lithography system and method with optimized throughput and stability | Jeng-Horng Chen, Shun-Der Wu, Anthony Yen | 2017-06-13 |
| 9679803 | Method for forming different patterns in a semiconductor structure using a single mask | Tsung-Min Huang, Chung-Ju Lee, Chih-Tsung Shih | 2017-06-13 |
| 9625824 | Extreme ultraviolet lithography collector contamination reduction | Jeng-Horng Chen, Shun-Der Wu, Tzu-Hsiang Chen | 2017-04-18 |
| 9618837 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-04-11 |
| 9612531 | Method of fabricating an integrated circuit with enhanced defect repairability | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-04-04 |
| 9588419 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-03-07 |
| 9575412 | Method and system for reducing pole imbalance by adjusting exposure intensity | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-02-21 |
| 9557636 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Shinn-Sheng Yu, Anthony Yen | 2017-01-31 |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |
| 9535334 | Extreme ultraviolet lithography process to print low pattern density features | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |