Issued Patents 2017
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9664999 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-05-30 |
| 9651857 | Mask and method for forming the same | Yun-Yue Lin, Hsin-Chang Lee, Ta-Cheng Lien, Anthony Yen | 2017-05-16 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-01-31 |
| 9558944 | System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle | Chia-Hao Hsu, Chia-Chen Chen, Jui-Ching Wu, Shang-Chieh Chien, Chia-Ching Huang | 2017-01-31 |