Issued Patents 2017
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9816180 | Selective deposition | Eva Tois | 2017-11-14 |
| 9812320 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2017-11-07 |
| 9721786 | Sulfur-containing thin films | Fu Tang, Michael Eugene Givens, Jan Willem Maes, Qi Xie | 2017-08-01 |
| 9679808 | Selective formation of metallic films on metallic surfaces | Antti Niskanen, Marko Tuominen | 2017-06-13 |
| 9677173 | Precursors and methods for atomic layer deposition of transition metal oxides | Timo Hatanpää, Jaakko Niinisto, Mikko Ritala, Markku Leskelä | 2017-06-13 |
| 9634106 | Doped metal germanide and methods for making the same | Viljami Pore, Tom E. Blomberg, Eva Tois | 2017-04-25 |
| 9631272 | Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds | Dong Li, Steven Marcus, Wei Li | 2017-04-25 |
| 9587307 | Enhanced deposition of noble metals | Marko Tuominen, Antti Rahtu | 2017-03-07 |
| 9583348 | Silane and borane treatments for titanium carbide films | Jerry Chen, Vladimir Machkaoutsan, Brennan Milligan, Jan Willem Maes, Eric James Shero +2 more | 2017-02-28 |
| 9564309 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda | 2017-02-07 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Ryu Nakano +1 more | 2017-02-07 |