Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9818601 | Substrate processing apparatus and method of processing substrate | Masaki Tokunaga, Masaru Zaitsu | 2017-11-14 |
| 9812319 | Method for forming film filled in trench without seam or void | Hideaki Fukuda | 2017-11-07 |
| 9754779 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa | 2017-09-05 |
| 9627221 | Continuous process incorporating atomic layer etching | Masaru Zaitsu, Hideaki Fukuda | 2017-04-18 |
| 9564309 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Hideaki Fukuda, Suvi Haukka | 2017-02-07 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2017-02-07 |