Issued Patents 2016
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529272 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9529250 | EUV mask with ITO absorber to suppress out of band radiation | Yi-Ling Hsieh, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9529249 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9488905 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-11-08 |
| 9448491 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-20 |
| 9442365 | Mask for extreme ultraviolet lithography and method of fabricating same | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-13 |
| 9442384 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-13 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2016-09-13 |
| 9429858 | Rotary EUV collector | Shang-Chieh Chien, Shu-Hao Chang, Jui-Ching Wu, Tsung-Yu Chen, Tzu-Hsiang Chen +2 more | 2016-08-30 |
| 9418862 | Method for integrated circuit patterning | Tsung-Min Huang, Chieh-Han Wu, Chung-Ju Lee, Chih-Tsung Shih, Shinn-Sheng Yu | 2016-08-16 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2016-08-16 |
| 9412647 | Via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-08-09 |
| 9405195 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-08-02 |
| 9377696 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-06-28 |
| 9354507 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-05-31 |
| 9336986 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Wen-Chun Huang +1 more | 2016-05-10 |
| 9316900 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-04-19 |
| 9305799 | Method and system for E-beam lithography with multi-exposure | Pei-Shiang Chen, Hung-Chun Wang | 2016-04-05 |
| 9304390 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-04-05 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu +1 more | 2016-03-15 |
| 9280046 | Method of fabricating mask | Anthony Yen, Chih-Tsung Shih, Ming-Jiun Yao, Yen-Cheng Lu, Shinn-Sheng Yu +1 more | 2016-03-08 |
| 9261774 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-02-16 |
| 9256123 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2016-02-09 |
| 9257282 | Method of semiconductor integrated circuit fabrication | Chih-Tsung Shih, Tsung-Min Huang, Chung-Ju Lee, Shinn-Sheng Yu, Anthony Yen | 2016-02-09 |
| 9252048 | Metal and via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-02-02 |