Issued Patents 2016
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529271 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Pei-Yi Liu | 2016-12-27 |
| 9519225 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-12-13 |
| 9436787 | Method of fabricating an integrated circuit with optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Burn Jeng Lin | 2016-09-06 |
| 9436788 | Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Burn Jeng Lin | 2016-09-06 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Jeng-Horng Chen, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2016-08-16 |
| 9390891 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Jaw-Jung Shin, Burn Jeng Lin | 2016-07-12 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2016-05-03 |
| 9291913 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Burn Jeng Lin | 2016-03-22 |
| 9229332 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-01-05 |