Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529959 | System and method for pattern correction in e-beam lithography | Hsu-Ting Huang, Wen-Chun Huang, Ru-Gun Liu | 2016-12-27 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Jeng-Horng Chen, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2016-08-16 |
| 9411924 | Methodology for pattern density optimization | Ming-Hui Chih, Ping-Chieh Wu, Chun-Hung Wu, Wen-Hao Liu, Cheng-Hsuan Huang +3 more | 2016-08-09 |
| 9390217 | Methodology of optical proximity correction optimization | Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Feng-Ju Chang, Cheng Kun Tsai +2 more | 2016-07-12 |
| 9336986 | Electron beam data storage system and method for high volume manufacturing | Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen, Wen-Chun Huang +1 more | 2016-05-10 |
| 9305799 | Method and system for E-beam lithography with multi-exposure | Pei-Shiang Chen, Jeng-Horng Chen | 2016-04-05 |
| 9298083 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Ching-Hsu Chang, Boren Luo, Wen-Chun Huang, Ru-Gun Liu | 2016-03-29 |
| 9262578 | Method for integrated circuit manufacturing | Ching-Hsu Chang, Feng-Ju Chang, Chun-Hung Wu, Ping-Chieh Wu, Wen-Hao Liu +5 more | 2016-02-16 |