Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529271 | Grid refinement method | Wen-Chuan Wang, Jaw-Jung Shin, Pei-Yi Liu, Shy-Jay Lin | 2016-12-27 |
| 9524939 | Multiple edge enabled patterning | Ming-Feng Shieh, Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh | 2016-12-20 |
| 9519225 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-12-13 |
| 9436787 | Method of fabricating an integrated circuit with optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin | 2016-09-06 |
| 9436788 | Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin | 2016-09-06 |
| 9390891 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Jaw-Jung Shin, Shy-Jay Lin | 2016-07-12 |
| 9330933 | Method and apparatus for planarizing a polymer layer | — | 2016-05-03 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2016-05-03 |
| 9291913 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Shy-Jay Lin | 2016-03-22 |
| 9287125 | Multiple edge enabled patterning | Ming-Feng Shieh, Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh | 2016-03-15 |
| 9229332 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-01-05 |