MS

Ming-Feng Shieh

TSMC: 18 patents #48 of 2,623Top 2%
Overall (2016): #1,792 of 481,213Top 1%
18
Patents 2016

Issued Patents 2016

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
9524939 Multiple edge enabled patterning Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin 2016-12-20
9502261 Spacer etching process for integrated circuit design Ru-Gun Liu, Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee +6 more 2016-11-22
9466486 Method for integrated circuit patterning Ru-Gun Liu, Hung-Chang Hsieh, Tien-I Bao, Chung-Ju Lee, Shau-Lin Shue 2016-10-11
9443768 Method of making a FinFET device Hung-Chang Hsieh, Han-Wei Wu 2016-09-13
9437497 Method of making a FinFET device Weng-Hung Tseng, Tzung-Hua Lin, Hung-Chang Hsieh 2016-09-06
9437415 Layer alignment in FinFET fabrication Kuei-Liang Lu 2016-09-06
9368594 Method of forming a fin-like BJT Chih-Sheng Chang, Yi-Tang Lin 2016-06-14
9362132 Systems and methods for a sequential spacer scheme Shih-Ming Chang, Ru-Gun Liu, Tsai-Sheng Gau 2016-06-07
9362169 Self-aligned semiconductor fabrication with fosse features Shih-Ming Chang, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau 2016-06-07
9356021 Self-alignment for two or more layers and methods of forming same Shih-Ming Chang, Ru-Gun Liu, Ken-Hsien Hsieh, Chih-Ming Lai, Tsai-Sheng Gau 2016-05-31
9337083 Multi-layer metal contacts Wen-Hung Tseng, Chih-Ming Lai, Ken-Hsien Hsieh, Tsai-Sheng Gau, Ru-Gun Liu 2016-05-10
9324866 Structure and method for transistor with line end extension Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more 2016-04-26
9305841 Method of patterning a feature of a semiconductor device Yen-Chun Huang, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau 2016-04-05
9287125 Multiple edge enabled patterning Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin 2016-03-15
9281193 Patterning method for semiconductor device fabrication Yen-Chun Huang, Chih-Ming Lai, Ken-Hsien Hsieh 2016-03-08
9252021 Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices Hoi-Tou Ng, Kuei-Liang Lu, Ru-Gun Liu 2016-02-02
9245763 Mechanisms for forming patterns using multiple lithography processes Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau 2016-01-26
9236267 Cut-mask patterning process for fin-like field effect transistor (FinFET) device Ho Wei De, Kuei-Liang Lu, Ching-Yu Chang 2016-01-12