Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9525049 | Method for fabricating fin field effect transistors | Clement Hsingjen Wann, Ling-Yen Yeh, Chi-Yuan Shih, Chih-Sheng Chang | 2016-12-20 |
| 9472672 | Eliminating fin mismatch using isolation last | Chih-Yu Hsu, Clement Hsingjen Wann, Chih-Sheng Chang | 2016-10-18 |
| 9472550 | Adjusted fin width in integrated circuitry | Chien-Hsun Wang, Chih-Sheng Chang | 2016-10-18 |
| 9461069 | Systems and methods for integrating different channel materials into a CMOS circuit by using a semiconductor structure having multiple transistor layers | Clement Hsingjen Wann | 2016-10-04 |
| 9443869 | Systems and methods for a semiconductor structure having multiple semiconductor-device layers | Chun Hsiung Tsai, Clement Hsingjen Wann | 2016-09-13 |
| 9379217 | FinFETs and the methods for forming the same | Chia-Cheng Ho, Tzu-Chiang Chen, Chih-Sheng Chang | 2016-06-28 |
| 9373623 | Multi-layer semiconductor structures for fabricating inverter chains | I-Fan Lin, Cheng-Hung Yeh, Hsien-Hsin Sean Lee, Chou-Kun Lin | 2016-06-21 |
| 9368594 | Method of forming a fin-like BJT | Chih-Sheng Chang, Ming-Feng Shieh | 2016-06-14 |
| 9324866 | Structure and method for transistor with line end extension | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2016-04-26 |
| 9269641 | Monitor test key of epi profile | Chih-Sheng Chang, Chia-Cheng Ho | 2016-02-23 |
| 9257343 | Method for fabricating fin field effect transistors | Clement Hsingjen Wann, Ling-Yen Yeh, Chi-Yuan Shih, Chih-Sheng Chang | 2016-02-09 |