Issued Patents 2016
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529265 | Method of preparing and using photosensitive material | An-Ren Zi, Chen-Hau Wu | 2016-12-27 |
| 9502231 | Photoresist layer and method | Chen-Yu Liu | 2016-11-22 |
| 9488913 | Photoresist having decreased outgassing | Wei-Han Lai | 2016-11-08 |
| 9460909 | Method for manufacturing semiconductor device | Chen-Yu Liu | 2016-10-04 |
| 9459536 | Negative tone developer composition for extreme ultraviolet lithography | Wei-Han Lai | 2016-10-04 |
| 9436086 | Anti-reflective layer and method | Yu-Chung Su, Wen-Yun Wang | 2016-09-06 |
| 9389510 | Patterning process and chemical amplified photoresist composition | Chien-Wei Wang | 2016-07-12 |
| 9360758 | Semiconductor device process filter and method | Kuan-Hsin Lo | 2016-06-07 |
| 9354521 | Photoresist system and method | Wei-Han Lai | 2016-05-31 |
| 9349622 | Method and apparatus for planarization of substrate coatings | Wen-Yun Wang, Cheng-Han Wu, Yu-Chung Su | 2016-05-24 |
| 9261786 | Photosensitive material and method of photolithography | — | 2016-02-16 |
| 9256133 | Apparatus and method for developing process | — | 2016-02-09 |
| 9256128 | Method for manufacturing semiconductor device | Chen-Yu Liu | 2016-02-09 |
| 9245751 | Anti-reflective layer and method | Yu-Chung Su, Wen-Yun Wang | 2016-01-26 |
| 9239520 | Photoresist defect reduction system and method | Wen-Yun Wang | 2016-01-19 |
| 9236267 | Cut-mask patterning process for fin-like field effect transistor (FinFET) device | Ho Wei De, Kuei-Liang Lu, Ming-Feng Shieh | 2016-01-12 |