Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9389510 | Patterning process and chemical amplified photoresist composition | Ching-Yu Chang | 2016-07-12 |
| 9323155 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Hsiao-Wei Yeh, Chih-An Lin, Feng-Cheng Hsu | 2016-04-26 |