Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9323155 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Hsiao-Wei Yeh, Chien-Wei Wang, Feng-Cheng Hsu | 2016-04-26 |
CL
Chih-An Lin
Overall (2016): #439,360 of 481,213Top 95%
1
Patents 2016