Issued Patents 2016
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530200 | Method and system for inspection of a patterned structure | Wen-Chang Hsueh, Hsin-Chang Lee | 2016-12-27 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-09-13 |
| 9429835 | Structure and method of photomask with reduction of electron-beam scatterring | Wen-Chang Hsueh, Hsin-Chang Lee | 2016-08-30 |
| 9373552 | Method of calibrating or exposing a lithography tool | Yu-Chao Lin, Chia-Hao Hsu, Kuo-Yu Wu, Chao-Cheng Chen | 2016-06-21 |
| 9366953 | Lithography mask | Yun-Yue Lin, Hsin-Chang Lee, Anthony Yen | 2016-06-14 |
| 9360749 | Pellicle structure and method for forming the same | Yun-Yue Lin, Hsin-Chang Lee, Anthony Yen | 2016-06-07 |
| 9341940 | Reticle and method of fabricating the same | Wen-Chang Hsueh, Ta-Cheng Lien, Hsin-Chang Lee | 2016-05-17 |
| 9341937 | Lithography system and method for patterning photoresist layer on EUV mask | Yun-Yue Lin, Hsin-Chang Lee, Anthony Yen | 2016-05-17 |
| 9310675 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Hsin-Chang Lee, Anthony Yen | 2016-04-12 |
| 9287179 | Composite dummy gate with conformal polysilicon layer for FinFET device | Yuan-Sheng Huang, Tzu-Yen Hsieh, Ming-Ching Chang, Chao-Cheng Chen | 2016-03-15 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-03-15 |
| 9256142 | Pellicle mounting system and method | Yeh Lee-Chih, Hsin-Chang Lee, Anthony Yen, Ming-Jiun Yao | 2016-02-09 |
| 9256123 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-02-09 |
| 9244341 | Photomask and method for forming the same | Hsin-Chang Lee, Pei-Cheng Hsu, Anthony Yen | 2016-01-26 |