Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530200 | Method and system for inspection of a patterned structure | Wen-Chang Hsueh, Chia-Jen Chen | 2016-12-27 |
| 9429835 | Structure and method of photomask with reduction of electron-beam scatterring | Wen-Chang Hsueh, Chia-Jen Chen | 2016-08-30 |
| 9366953 | Lithography mask | Yun-Yue Lin, Chia-Jen Chen, Anthony Yen | 2016-06-14 |
| 9360749 | Pellicle structure and method for forming the same | Yun-Yue Lin, Chia-Jen Chen, Anthony Yen | 2016-06-07 |
| 9341937 | Lithography system and method for patterning photoresist layer on EUV mask | Yun-Yue Lin, Chia-Jen Chen, Anthony Yen | 2016-05-17 |
| 9341940 | Reticle and method of fabricating the same | Wen-Chang Hsueh, Chia-Jen Chen, Ta-Cheng Lien | 2016-05-17 |
| 9310675 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Chia-Jen Chen, Anthony Yen | 2016-04-12 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-03-15 |
| 9280046 | Method of fabricating mask | Anthony Yen, Chih-Tsung Shih, Ming-Jiun Yao, Yen-Cheng Lu, Shinn-Sheng Yu +1 more | 2016-03-08 |
| 9256142 | Pellicle mounting system and method | Yeh Lee-Chih, Chia-Jen Chen, Anthony Yen, Ming-Jiun Yao | 2016-02-09 |
| 9244341 | Photomask and method for forming the same | Chia-Jen Chen, Pei-Cheng Hsu, Anthony Yen | 2016-01-26 |