| 9524889 |
Processing systems and apparatus adapted to process substrates in electronic device manufacturing |
Steve Hongkham, Paul B. Reuter, Eric A. Englhardt, Ganesh Balasubramanian, JuanCarlos Rocha-Alvarez |
2016-12-20 |
| 9520301 |
Etching method using plasma, and method of fabricating semiconductor device including the etching method |
Go-jun Kim, Vladimir Volynets, Sang Jin An, Hee-jeon Yang, Sang Heon Lee +2 more |
2016-12-13 |
| 9502218 |
RPS assisted RF plasma source for semiconductor processing |
Saurabh Garg, Jang-Gyoo Yang |
2016-11-22 |
| 9449850 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more |
2016-09-20 |
| 9384997 |
Dry-etch selectivity |
He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park +2 more |
2016-07-05 |
| 9373517 |
Semiconductor processing with DC assisted RF power for improved control |
Jang-Gyoo Yang, Soonam Park, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman |
2016-06-21 |
| 9362130 |
Enhanced etching processes using remote plasma sources |
Nitin K. Ingle, Dmitry Lubomirsky, Shankar Venkataraman |
2016-06-07 |
| 9267739 |
Pedestal with multi-zone temperature control and multiple purge capabilities |
Jang-Gyoo Yang, Alexander Tam, Elisha Tam |
2016-02-23 |
