CJ

Cyril Cabral, Jr.

IBM: 12 patents #28 of 5,214Top 1%
📍 Mahopac, NY: #1 of 26 inventorsTop 4%
🗺 New York: #26 of 8,003 inventorsTop 1%
Overall (2005): #699 of 245,428Top 1%
12
Patents 2005

Issued Patents 2005

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6979393 Method for plating copper conductors and devices formed Kenneth P. Rodbell, Panayotis Andricacos, Lynne M. Gignac, Cyprian Emeka Uzoh, Peter S. Locke 2005-12-27
6972250 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Roy A. Carruthers, Kevin K. Chan, Jack O. Chu, Guy M. Cohen, Steven J. Koester +2 more 2005-12-06
6967131 Field effect transistor with electroplated metal gate Katherine L. Saenger, Emanuel I. Cooper, Hariklia Deligianni, Panayotis Andricacos, Philippe M. Vereecken 2005-11-22
6943097 Atomic layer deposition of metallic contacts, gates and diffusion barriers Hyungjun Kim, Stephen M. Rossnagel 2005-09-13
6933577 High performance FET with laterally thin extension Omer H. Dokumaci, Oleg Gluschenkov 2005-08-23
6927117 Method for integration of silicide contacts and silicide gate metals Jakub Kedzierski, Victor Ku, Christian Lavoie, Vijay Narayanan, An Steegen 2005-08-09
6921711 Method for forming metal replacement gate of high performance Paul C. Jamison, Victor Ku, Ying Li, Vijay Narayanan, An Steegen +2 more 2005-07-26
6909145 Metal spacer gate for CMOS FET Lawrence A. Clevenger, Louis L. Hsu, Joseph F. Shepard, Jr., Kwong Hon Wong 2005-06-21
6905560 Retarding agglomeration of Ni monosilicide using Ni alloys Roy A. Carruthers, Christophe Detavernier, James M. E. Harper, Christian Lavoie 2005-06-14
6878624 Pre-anneal of CoSi, to prevent formation of amorphous layer between Ti-O-N and CoSi John Bruley, Christian Lavoie, Tina Wagner, Yun-Yu Wang, Horati S. Wildman +1 more 2005-04-12
6862799 Method for changing an electrical resistance of a resistor Arne Ballantine, Daniel C. Edelstein, Anthony K. Stamper 2005-03-08
6846734 Method and process to make multiple-threshold metal gates CMOS technology Ricky S. Amos, Katayun Barmak, Diane C. Boyd, Meikei Leong, Thomas S. Kanarsky +1 more 2005-01-25