Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6974779 | Interfacial oxidation process for high-k gate dielectric process integration | David L. O'Meara, Cory Wajda, Tsuyoshi Takahashi, Alessandro C. Callegari, Kristen Scheer +1 more | 2005-12-13 |
| 6921711 | Method for forming metal replacement gate of high performance | Cyril Cabral, Jr., Victor Ku, Ying Li, Vijay Narayanan, An Steegen +2 more | 2005-07-26 |
| 6893979 | Method for improved plasma nitridation of ultra thin gate dielectrics | Mukesh V. Khare, Christopher P. D'Emic, Thomas T. Hwang, James J. Quinlivan, Beth Ward | 2005-05-17 |
| 6891231 | Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrier | Nestor A. Bojarczuk, Kevin K. Chan, Christopher P. D'Emic, Evgeni Gousev, Supratik Guha +1 more | 2005-05-10 |