KC

Kevin K. Chan

IBM: 10 patents #41 of 5,214Top 1%
📍 Staten Island, NY: #1 of 36 inventorsTop 3%
🗺 New York: #53 of 8,003 inventorsTop 1%
Overall (2005): #1,077 of 245,428Top 1%
10
Patents 2005

Issued Patents 2005

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
6972250 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Cyril Cabral, Jr., Roy A. Carruthers, Jack O. Chu, Guy M. Cohen, Steven J. Koester +2 more 2005-12-06
6946696 Self-aligned isolation double-gate FET Guy M. Cohen, Meikei Ieong, Ronnen Andrew Roy, Paul M. Solomon, Min Yang 2005-09-20
6927454 Split poly-SiGe/poly-Si alloy gate stack Jia Chen, Shih-Fen Huang, Edward J. Nowak 2005-08-09
6916694 Strained silicon-channel MOSFET using a damascene gate process Hussein I. Hanafi, David J. Frank 2005-07-12
6893948 Method of reducing polysilicon depletion in a polysilicon gate electrode by depositing polysilicon of varying grain size Arne Ballantine, Jeffrey D. Gilbert, Kevin M. Houlihan, Glen L. Miles, James J. Quinlivan +3 more 2005-05-17
6891231 Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrier Nestor A. Bojarczuk, Christopher P. D'Emic, Evgeni Gousev, Supratik Guha, Paul C. Jamison +1 more 2005-05-10
6891227 Self-aligned nanotube field effect transistor and method of fabricating same Joerg Appenzeller, Phaedon Avouris, Richard Martel, Hon-Sum Philip Wong, Philip G. Collins 2005-05-10
6870232 Scalable MOS field effect transistor Jack O. Chu, Khalid EzzEldin Ismail, Stephen A. Rishton, Katherine L. Saenger 2005-03-22
6841831 Fully-depleted SOI MOSFETs with low source and drain resistance and minimal overlap capacitance using a recessed channel damascene gate process Hussein I. Hanafi, Diane C. Boyd, Wesley C. Natzle, Leathen Shi 2005-01-11
6838695 CMOS device structure with improved PFET gate electrode Bruce B. Doris, Ashima B. Chakravarti, Daniel A. Uriarte 2005-01-04