Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6974779 | Interfacial oxidation process for high-k gate dielectric process integration | David L. O'Meara, Cory Wajda, Tsuyoshi Takahashi, Alessandro C. Callegari, Sufi Zafar +1 more | 2005-12-13 |
| 6930060 | Method for forming a uniform distribution of nitrogen in silicon oxynitride gate dielectric | Anthony I. Chou, Michael P. Chudzik, Toshiharu Furukawa, Oleg Gluschenkov, Paul Kirsch +1 more | 2005-08-16 |