TF

Toshiharu Furukawa

IBM: 12 patents #28 of 5,214Top 1%
📍 South Burlington, VT: #4 of 161 inventorsTop 3%
🗺 Vermont: #7 of 502 inventorsTop 2%
Overall (2005): #594 of 245,428Top 1%
12
Patents 2005

Issued Patents 2005

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6970372 Dual gated finfet gain cell Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Mark E. Masters, Peter H. Mitchell 2005-11-29
6960510 Method of making sub-lithographic features Sadanand V. Deshpande, David V. Horak, Wesley C. Natzle, Akihisa Sekiguchi, Len Yuan Tsou +1 more 2005-11-01
6940134 Semiconductor with contact contacting diffusion adjacent gate electrode Mark C. Hakey, Steven J. Holmes, David V. Horak 2005-09-06
6936879 Increased capacitance trench capacitor Mark C. Hakey, Steven J. Holmes, William H. Ma 2005-08-30
6930060 Method for forming a uniform distribution of nitrogen in silicon oxynitride gate dielectric Anthony I. Chou, Michael P. Chudzik, Oleg Gluschenkov, Paul Kirsch, Kristen Scheer +1 more 2005-08-16
6924200 Methods using disposable and permanent films for diffusion and implantation doping Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma, Patricia Marmillion +1 more 2005-08-02
6919277 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions Mark C. Hakey, Steven J. Holmes, David V. Horak 2005-07-19
6891235 FET with T-shaped gate Mark C. Hakey, Steven J. Holmes, David V. Horak, Edward J. Nowak 2005-05-10
6891226 Dual gate logic device Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma 2005-05-10
6875703 Method for forming quadruple density sidewall image transfer (SIT) structures Mark C. Hakey, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell 2005-04-05
6875685 Method of forming gas dielectric with support structure Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit +1 more 2005-04-05
6867143 Method for etching a semiconductor substrate using germanium hard mask Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma 2005-03-15