DH

David V. Horak

IBM: 15 patents #13 of 5,214Top 1%
📍 South Burlington, VT: #2 of 161 inventorsTop 2%
🗺 Vermont: #3 of 502 inventorsTop 1%
Overall (2005): #368 of 245,428Top 1%
15
Patents 2005

Issued Patents 2005

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
6970372 Dual gated finfet gain cell Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Mark E. Masters, Peter H. Mitchell 2005-11-29
6963132 Integrated semiconductor device having co-planar device surfaces Mark C. Hakey, Steven J. Holmes, Harold G. Linde, Edmund J. Sprogis 2005-11-08
6960510 Method of making sub-lithographic features Sadanand V. Deshpande, Toshiharu Furukawa, Wesley C. Natzle, Akihisa Sekiguchi, Len Yuan Tsou +1 more 2005-11-01
6939791 Contact capping local interconnect Robert M. Geffken, Anthony K. Stamper 2005-09-06
6940134 Semiconductor with contact contacting diffusion adjacent gate electrode Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes 2005-09-06
6924200 Methods using disposable and permanent films for diffusion and implantation doping Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma, Patricia Marmillion +1 more 2005-08-02
6919277 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes 2005-07-19
6891235 FET with T-shaped gate Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Edward J. Nowak 2005-05-10
6890828 Method for supporting a bond pad in a multilevel interconnect structure and support structure formed thereby Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit 2005-05-10
6891226 Dual gate logic device Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma 2005-05-10
6884734 Vapor phase etch trim structure with top etch blocking layer Frederick Buehrer, Derek Chen, William Chu, Scott W. Crowder, Sadanand V. Deshpande +4 more 2005-04-26
6875703 Method for forming quadruple density sidewall image transfer (SIT) structures Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell 2005-04-05
6875685 Method of forming gas dielectric with support structure Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit +1 more 2005-04-05
6867143 Method for etching a semiconductor substrate using germanium hard mask Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma 2005-03-15
6864041 Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching Jeffrey J. Brown, Sadanand V. Deshpande, Maheswaran Surendra, Len Yuan Tsou, Qingyun Yang +2 more 2005-03-08