Issued Patents 2005
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6946033 | Heated gas distribution plate for a processing chamber | Lun Tsuei, Soovo Sen, Ju-Hyung Lee, Juan Carlos Rocha-Alvarez, Inna Shmurun +2 more | 2005-09-20 |
| 6943127 | CVD plasma assisted lower dielectric constant SICOH film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Dian Sugiarto, Chen-An Chen +2 more | 2005-09-13 |
| 6932092 | Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy | Juan Carlos Rocha-Alvarez, Maosheng Zhao | 2005-08-23 |
| 6923189 | Cleaning of CVD chambers using remote source with cxfyoz based chemistry | Annamalai Lakshmanan, Ju-Hyung Lee, Troy Kim, Maosheng Zhao | 2005-08-02 |
| 6918012 | Streamlined cache coherency protocol system and method for a multiple processor single chip device | Padmanabha Venkitakrishnan, Stuart Siu | 2005-07-12 |
| 6913992 | Method of modifying interlayer adhesion | Francimar Schmitt, Li-Qun Xia, Son V. Nguyen | 2005-07-05 |
| 6902629 | Method for cleaning a process chamber | Yi Zheng, Vinita Singh, Srinivas D. Nemani, Chen-An Chen, Ju-Hyung Lee | 2005-06-07 |
| 6890850 | Method of depositing dielectric materials in damascene applications | Ju-Hyung Lee, Ping Xu, Li-Qun Xia, Fei Han, Ellie Yieh +5 more | 2005-05-10 |
| 6874014 | Chip multiprocessor with multiple operating systems | Stephen Richardson, Gary L. Vondran, Jr., Stuart Siu, Paul Keltcher, Padmanabha Venkitakrishnan +1 more | 2005-03-29 |
| 6855484 | Method of depositing low dielectric constant silicon carbide layers | Francimar Campana, Srinivas D. Nemani, Michael Chapin | 2005-02-15 |