Issued Patents 2003
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6670271 | Growing a dual damascene structure using a copper seed layer and a damascene resist structure | Ramkumar Subramanian, Bhanwar Singh, Bharath Rangarajan | 2003-12-30 |
| 6664191 | Non self-aligned shallow trench isolation process with disposable space to define sub-lithographic poly space | Unsoon Kim, Yider Wu, Yu Sun, Angela T. Hui, Chi Chang | 2003-12-16 |
| 6663723 | Vapor drying for cleaning photoresists | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2003-12-16 |
| 6650422 | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith | Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian | 2003-11-18 |
| 6649426 | System and method for active control of spacer deposition | Bharath Rangarajan, Bhanwar Singh | 2003-11-18 |
| 6645702 | Treat resist surface to prevent pattern collapse | Bharath Rangarajan, Bhanwar Singh | 2003-11-11 |
| 6643604 | System for uniformly heating photoresist | Ramkumar Subramanian, Bharath Rangarajan | 2003-11-04 |
| 6641963 | System and method for in situ control of post exposure bake time and temperature | Bharath Rangarajan, Bhanwar Singh, Ramkumar Subramanian | 2003-11-04 |
| 6635874 | Self-cleaning technique for contamination on calibration sample in SEM | Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo | 2003-10-21 |
| 6634805 | Parallel plate development | Khoi A. Phan, Bharath Rangarajan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-21 |
| 6630361 | Use of scatterometry for in-situ control of gaseous phase chemical trim process | Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian, Cristina Cheung | 2003-10-07 |
| 6629786 | Active control of developer time and temperature | Bharath Rangarajan, Bhanwar Singh, Ramkumar Subramanian | 2003-10-07 |
| 6613500 | Reducing resist residue defects in open area on patterned wafer using trim mask | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian, Jeff P. Erhardt | 2003-09-02 |
| 6605855 | CVD plasma process to fill contact hole in damascene process | Bhanwar Singh, Bharath Rangarajan, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2003-08-12 |
| 6603211 | Method and system for providing a robust alignment mark at thin oxide layers | Hao Fang, Maria C. Chan, King Wai Kelwin Ko | 2003-08-05 |
| 6591658 | Carbon nanotubes as linewidth standards for SEM & AFM | Sanjay K. Yedur, Bhanwar Singh, Bryan K. Choo, Ramkumar Subramanian | 2003-07-15 |
| 6592932 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur | 2003-07-15 |
| 6573498 | Electric measurement of reference sample in a CD-SEM and method for calibration | Bharath Rangarajan, Bhanwar Singh, Khoi A. Phan | 2003-06-03 |
| 6573497 | Calibration of CD-SEM by e-beam induced current measurement | Bharath Rangarajan, Bhanwar Singh, Khoi A. Phan | 2003-06-03 |
| 6573480 | Use of thermal flow to remove side lobes | Bharath Rangarajan, Ramkumar Subramanian | 2003-06-03 |
| 6561706 | Critical dimension monitoring from latent image | Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian | 2003-05-13 |
| 6562248 | Active control of phase shift mask etching process | Ramkumar Subramanian, Bhanwar Singh | 2003-05-13 |
| 6556303 | Scattered signal collection using strobed technique | Bharath Rangarajan, Bhanwar Singh, Khoi A. Phan | 2003-04-29 |
| 6552790 | System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay | Bharath Rangarajan | 2003-04-22 |
| 6545753 | Using scatterometry for etch end points for dual damascene process | Ramkumar Subramanian, Bhanwar Singh | 2003-04-08 |