Issued Patents 2003
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6670271 | Growing a dual damascene structure using a copper seed layer and a damascene resist structure | Ramkumar Subramanian, Michael K. Templeton, Bhanwar Singh | 2003-12-30 |
| 6663723 | Vapor drying for cleaning photoresists | Michael K. Templeton, Ramkumar Subramanian, Khoi A. Phan | 2003-12-16 |
| 6654660 | Controlling thermal expansion of mask substrates by scatterometry | Bhanwar Singh, Christopher F. Lyons, Khoi A. Phan, Ramkumar Subramanian | 2003-11-25 |
| 6653221 | Method of forming a ground in SOI structures | Ramkumar Subramanian, Bhanwar Singh | 2003-11-25 |
| 6649426 | System and method for active control of spacer deposition | Michael K. Templeton, Bhanwar Singh | 2003-11-18 |
| 6650422 | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian | 2003-11-18 |
| 6645702 | Treat resist surface to prevent pattern collapse | Michael K. Templeton, Bhanwar Singh | 2003-11-11 |
| 6643604 | System for uniformly heating photoresist | Ramkumar Subramanian, Michael K. Templeton | 2003-11-04 |
| 6641963 | System and method for in situ control of post exposure bake time and temperature | Michael K. Templeton, Bhanwar Singh, Ramkumar Subramanian | 2003-11-04 |
| 6634805 | Parallel plate development | Michael K. Templeton, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-21 |
| 6632283 | System and method for illuminating a semiconductor processing system | Bhanwar Singh, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-14 |
| 6630361 | Use of scatterometry for in-situ control of gaseous phase chemical trim process | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian, Cristina Cheung | 2003-10-07 |
| 6629786 | Active control of developer time and temperature | Michael K. Templeton, Bhanwar Singh, Ramkumar Subramanian | 2003-10-07 |
| 6617087 | Use of scatterometry to measure pattern accuracy | Bhanwar Singh, Ramkumar Subramanian | 2003-09-09 |
| 6612319 | Low defect EBR nozzle | Khoi A. Phan, Ursula Q. Quinto | 2003-09-02 |
| 6605855 | CVD plasma process to fill contact hole in damascene process | Bhanwar Singh, Michael K. Templeton, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2003-08-12 |
| 6602727 | Scatterometry based active control of exposure conditions | Bhanwar Singh, Ramkumar Subramanian | 2003-08-05 |
| 6592932 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2003-07-15 |
| 6594024 | Monitor CMP process using scatterometry | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Carmen Morales | 2003-07-15 |
| 6593210 | Self-aligned/maskless reverse etch process using an inorganic film | Bhanwar Singh, Ursula Q. Quinto | 2003-07-15 |
| 6583871 | System and method to measure closed area defects | Bhanwar Singh, Khoi A. Phan, Ramkumar Subramanian | 2003-06-24 |
| 6579651 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh | 2003-06-17 |
| 6579733 | Using scatterometry to measure resist thickness and control implant | Bhanwar Singh, Ramkumar Subramanian | 2003-06-17 |
| 6573498 | Electric measurement of reference sample in a CD-SEM and method for calibration | Bhanwar Singh, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |
| 6573497 | Calibration of CD-SEM by e-beam induced current measurement | Bhanwar Singh, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |