Issued Patents 2002
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500773 | Method of depositing organosilicate layers | Frederic Gaillard, Ellie Yieh | 2002-12-31 |
| 6486082 | CVD plasma assisted lower dielectric constant sicoh film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Dian Sugiarto, Chen-An Chen +2 more | 2002-11-26 |
| 6486061 | Post-deposition treatment to enhance properties of Si-O-C low K films | Frederic Gaillard, Ellie Yieh, Tian-Hoe Lim | 2002-11-26 |
| 6472333 | Silicon carbide cap layers for low dielectric constant silicon oxide layers | Paul Fisher, Margaret Gotuaco, Frederic Gaillard, Ellie Yieh | 2002-10-29 |
| 6465366 | Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers | Srinivas D. Nemani, Ellie Yieh | 2002-10-15 |
| 6465372 | Surface treatment of C-doped SiO2 film to enhance film stability during O2 ashing | Tian-Hoe Lim, Frederic Gaillard, Ellie Yieh | 2002-10-15 |
| 6426015 | Method of reducing undesired etching of insulation due to elevated boron concentrations | Francimar Campana, Ellie Yieh | 2002-07-30 |
| 6413583 | Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound | Farhad Moghadam, David Cheung, Ellie Yieh, Wai-Fan Yau, Chi-I Lang +4 more | 2002-07-02 |
| 6360685 | Sub-atmospheric chemical vapor deposition system with dopant bypass | Ellie Yieh | 2002-03-26 |
| 6352591 | Methods and apparatus for shallow trench isolation | Ellie Yieh, Srinivas D. Nemani | 2002-03-05 |
| 6347636 | Methods and apparatus for gettering fluorine from chamber material surfaces | Visweswaren Sivaramakrishnan, Srinivas D. Nemani, Ellie Yieh, Gary Fong | 2002-02-19 |
| 6348099 | Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions | Ellie Yieh, Srinivas D. Nemani | 2002-02-19 |