Issued Patents 2002
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6491799 | Method for forming a thin dielectric layer | Karsten Wieczorek, Manfred Horstmann | 2002-12-10 |
| 6489240 | Method for forming copper interconnects | John A. Iacoponi, Paul R. Besser, Frank Mauersberger, Errol Todd Ryan, William S. Brennan +1 more | 2002-12-03 |
| 6458678 | Transistor formed using a dual metal process for gate and source/drain region | Thomas E. Spikes, Jr., David Wu | 2002-10-01 |
| 6429052 | Method of making high performance transistor with a reduced width gate electrode and device comprising same | Mark I. Gardner, John J. Bush | 2002-08-06 |
| 6426262 | Method of analyzing the effects of shadowing of angled halo implants | Mark B. Fuselier, Jon D. Cheek, Marilyn I. Wright | 2002-07-30 |
| 6413846 | Contact each methodology and integration scheme | Paul R. Besser, Errol Todd Ryan, Frank Mauersberger, William S. Brennan, John A. Iacoponi +1 more | 2002-07-02 |
| 6410409 | Implanted barrier layer for retarding upward diffusion of substrate dopant | Mark I. Gardner, Robert Dawson, H. Jim Fulford, Mark W. Michael, Bradley T. Moore +1 more | 2002-06-25 |
| 6410967 | Transistor having enhanced metal silicide and a self-aligned gate electrode | Mark I. Gardner, Charles E. May | 2002-06-25 |
| 6403445 | Enhanced trench isolation structure | Mark I. Gardner, Charles E. May | 2002-06-11 |
| 6380055 | Dopant diffusion-retarding barrier region formed within polysilicon gate layer | Mark I. Gardner, Robert Dawson, H. Jim Fulford, Mark W. Michael, Bradley T. Moore +1 more | 2002-04-30 |
| 6376350 | Method of forming low resistance gate electrode | Michael Duane, Jeffrey C. Haines | 2002-04-23 |
| 6372588 | Method of making an IGFET using solid phase diffusion to dope the gate, source and drain | Derick J. Wristers, Robert Dawson, H. Jim Fulford, Mark I. Gardner, Mark W. Michael +1 more | 2002-04-16 |
| 6358826 | Device improvement by lowering LDD resistance with new spacer/silicide process | Manfred Horstmann, Karsten Wieczorek | 2002-03-19 |
| 6352885 | Transistor having a peripherally increased gate insulation thickness and a method of fabricating the same | Karsten Wieczorek, Manfred Horstmann | 2002-03-05 |
| 6346463 | Method for forming a semiconductor device with a tailored well profile | Akif Sultan | 2002-02-12 |
| 6337217 | Method and apparatus for improved focus in optical processing | Karen Turnquest | 2002-01-08 |