MK

Ming-Hong Kuo

VS Vanguard International Semiconductor: 10 patents #58 of 585Top 10%
ET Etron Technology: 8 patents #16 of 145Top 15%
MC Mcube: 2 patents #24 of 53Top 50%
IP Invention And Collaboration Laboratory Pte.: 1 patents #5 of 7Top 75%
📍 Hsinchu, CA: #157 of 400 inventorsTop 40%
Overall (All Time): #192,572 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
12125910 Transistor structure with increased gate dielectric thickness between gate-to-drain overlap region Chao-Chun Lu, Chun-Nan LU 2024-10-22
10479676 Apparatus and methods for integrated MEMS devices Ben Lee, Wen-Chih Chen, Wensen Tsai 2019-11-19
10046966 Apparatus and methods for integrated MEMS devices Ben Lee, Wen-Chih Chen, Wensen Tsai 2018-08-14
9935109 Dynamic memory structure Nicky C. Lu 2018-04-03
9685449 Dynamic memory structure Nicky C. Lu 2017-06-20
9397103 Dynamic memory structure Nicky C. Lu 2016-07-19
9105506 Dynamic memory structure Nicky C. Lu 2015-08-11
8724362 Transistor circuit layout structure 2014-05-13
8659068 Dynamic memory structure 2014-02-25
8331178 Memory device capable of operation in a burn in stress mode, method for performing burn in stress on a memory device, and method for detecting leakage current of a memory device Shi-Huei Liu, Tzu-Hao Chen, Te-Yi Yu 2012-12-11
6261923 Method to solve the dishing issue in CMP planarization by using a nitride hard mask for local inverse etchback and CMP Wei-Ray Lin, Fu-Liang Yang 2001-07-17
6184081 Method of fabricating a capacitor under bit line DRAM structure using contact hole liners Erik S. Jeng, Bi-Ling Chen, Wei-Ray Lin, Yu-Chun Ho 2001-02-06
6171929 Shallow trench isolator via non-critical chemical mechanical polishing Fu-Liang Yang, Chung-Ju Lee, Meow-Ru Hsu, Ing-Ruey Liaw 2001-01-09
6133599 Design and a novel process for formation of DRAM bit line and capacitor node contacts Jan-Mye Sung, Ing-Ruey Liaw 2000-10-17
6060348 Method to fabricate isolation by combining locos and shallow trench isolation for ULSI technology Fu-Liang Yang, Wei-Ray Lin, Erik S. Jeng 2000-05-09
6057210 Method of making a shallow trench isolation for ULSI formation via in-direct CMP process Fu-Liang Yang, Wei-Ray Lin 2000-05-02
6017813 Method for fabricating a damascene landing pad 2000-01-25
6008085 Design and a novel process for formation of DRAM bit line and capacitor node contacts Janmye Sung, Ing-Ruey Liaw 1999-12-28
5658822 Locos method with double polysilicon/silicon nitride spacer Shye-Lin Wu, Hsi-Chuan Chen 1997-08-19
5643824 Method of forming nitride sidewalls having spacer feet in a locos process Rong-Wu Chien, Hsu-Li Cheng 1997-07-01
5092266 Solder leveler 1992-03-03
4775090 Pin head assembly 1988-10-04