WL

Wei-Ray Lin

VS Vanguard International Semiconductor: 10 patents #58 of 585Top 10%
NT Nanya Technology: 4 patents #182 of 775Top 25%
TSMC: 2 patents #6,667 of 12,232Top 55%
Overall (All Time): #295,716 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
10879135 Overlay error and process window metrology Shang-Wei Fang, Jing-Sen Wang, Yuan-Yao Chang, Ting-Hua Hsieh, Pei-Hsuan Lee +1 more 2020-12-29
10510623 Overlay error and process window metrology Shang-Wei Fang, Jing-Sen Wang, Yuan-Yao Chang, Ting-Hua Hsieh, Pei-Hsuan Lee +1 more 2019-12-17
6329241 Methods for producing capacitor-node contact plugs of dynamic random-access memory 2001-12-11
6261923 Method to solve the dishing issue in CMP planarization by using a nitride hard mask for local inverse etchback and CMP Ming-Hong Kuo, Fu-Liang Yang 2001-07-17
6255161 Method of forming a capacitor and a contact plug 2001-07-03
6248643 Method of fabricating a self-aligned contact Chien-Sheng Hsieh, Fu-Liang Yang, Erik S. Jeng, Bor-Ru Sheu 2001-06-19
6187625 Method of fabricating crown capacitor Hsien-Wen Liu 2001-02-13
6184081 Method of fabricating a capacitor under bit line DRAM structure using contact hole liners Erik S. Jeng, Bi-Ling Chen, Yu-Chun Ho, Ming-Hong Kuo 2001-02-06
6180489 Formation of finely controlled shallow trench isolation for ULSI process Fu-Liang Yang, Bih-Tiao Lin, Erik S. Jeng 2001-01-30
6159821 Methods for shallow trench isolation Hsu-Li Cheng, Fu-Liang Yang 2000-12-12
6143664 Method of planarizing a structure having an interpoly layer Liang-Gi Yao, Chung-Ju Lee, Yue Chen, Yeur-Luen Tu 2000-11-07
6130128 Method of fabricating crown capacitor 2000-10-10
6117740 Method of forming a shallow trench isolation by using PE-oxide and PE-nitride multi-layer Li-Yeat Chen 2000-09-12
6060348 Method to fabricate isolation by combining locos and shallow trench isolation for ULSI technology Fu-Liang Yang, Ming-Hong Kuo, Erik S. Jeng 2000-05-09
6057210 Method of making a shallow trench isolation for ULSI formation via in-direct CMP process Fu-Liang Yang, Ming-Hong Kuo 2000-05-02
6001704 Method of fabricating a shallow trench isolation by using oxide/oxynitride layers Hsu-Li Cheng, Erik S. Jeng 1999-12-14