BL

Bih-Tiao Lin

TSMC: 7 patents #3,492 of 12,232Top 30%
VS Vanguard International Semiconductor: 7 patents #80 of 585Top 15%
WM Worldwide Semiconductor Manufacturing: 2 patents #19 of 58Top 35%
📍 Guoxing Township, TW: #15 of 230 inventorsTop 7%
Overall (All Time): #300,903 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
7685667 Post-CMP cleaning system Jin Lung Linh 2010-03-30
6821895 Dynamically adjustable slurry feed arm for wafer edge profile improvement in CMP Soon-Kang Huang 2004-11-23
6660629 Chemical mechanical polishing method for fabricating copper damascene structure 2003-12-09
6604849 Slurry dilution system with an ultrasonic vibrator capable of in-situ adjustment of slurry concentration Meng-Feng Tsai, Rong Jye Jang, Kung-Teng Huang 2003-08-12
6524950 Method of fabricating copper damascene 2003-02-25
6454917 High throughput and high performance copper electroplating tool 2002-09-24
6343977 Multi-zone conditioner for chemical mechanical polishing system SHUANG PENG 2002-02-05
6277751 Method of planarization Pao-Kang Niu, Chang-Sheng Lee, Sen-Nan Lee 2001-08-21
6218307 Method of fabricating shallow trench isolation structure 2001-04-17
6180489 Formation of finely controlled shallow trench isolation for ULSI process Fu-Liang Yang, Wei-Ray Lin, Erik S. Jeng 2001-01-30
6140240 Method for eliminating CMP induced microscratches Fu-Liang Yang, Tzu-Shih Yen, Bi-Ling Chen, Erik S. Jeng 2000-10-31
6089969 Powder-proof apparatus for a PECVD reactor chamber Min-Yuan Chung, Wen Chang Tseng 2000-07-18
6071789 Method for simultaneously fabricating a DRAM capacitor and metal interconnections Fu-Liang Yang, Erik S. Jeng, I-Ping Lee 2000-06-06
6054017 Chemical mechanical polishing pad with controlled polish rate Fu-Liang Yang 2000-04-25
6037259 Method for forming identifying characters on a silicon wafer Fu-Liang Yang 2000-03-14
5888124 Apparatus for polishing and cleaning a wafer Fu-Liang Yang 1999-03-30