SW

Shye-Lin Wu

TI Texas Instruments: 134 patents #19 of 12,488Top 1%
PS Powerchip Semiconductor: 20 patents #4 of 195Top 3%
AM Acer Semiconductor Manufacturing: 19 patents #1 of 3Top 35%
CC Chip Integration Tech. Co.: 7 patents #1 of 2Top 50%
VS Vanguard International Semiconductor: 6 patents #103 of 585Top 20%
TSMC: 5 patents #4,208 of 12,232Top 35%
TM Tsmc-Acer Semiconductor Manufacturing: 5 patents #1 of 10Top 10%
UN Unknown: 5 patents #3,065 of 83,584Top 4%
AI Acer Incorporated: 3 patents #287 of 935Top 35%
NC National Science Council: 2 patents #113 of 867Top 15%
Overall (All Time): #2,948 of 4,157,543Top 1%
212
Patents All Time

Issued Patents All Time

Showing 25 most recent of 212 patents

Patent #TitleCo-InventorsDate
7491633 High switching speed two mask schottky diode with high field breakdown 2009-02-17
7368371 Silicon carbide Schottky diode and method of making the same 2008-05-06
7187046 Method of forming an N channel and P channel finfet device on the same semiconductor substrate Chung-Cheng Wu 2007-03-06
7078780 Schottky barrier diode and method of making the same 2006-07-18
7064408 Schottky barrier diode and method of making the same 2006-06-20
6998694 High switching speed two mask Schottky diode with high field breakdown 2006-02-14
6936905 Two mask shottky diode with locos structure 2005-08-30
6825073 Schottky diode with high field breakdown and low reverse leakage current 2004-11-30
6770516 Method of forming an N channel and P channel FINFET device on the same semiconductor substrate Chung-Cheng Wu 2004-08-03
6649308 Ultra-short channel NMOSFETS with self-aligned silicide contact 2003-11-18
6569729 Method of fabricating three dimensional CMOSFET devices for an embedded DRAM application Chung-Cheng Wu 2003-05-27
6555438 Method for fabricating MOSFETs with a recessed self-aligned silicide contact and extended source/drain junctions 2003-04-29
6548362 Method of forming MOSFET with buried contact and air-gap gate structure 2003-04-15
6432785 Method for fabricating ultra short channel PMOSFET with buried source/drain junctions and self-aligned silicide 2002-08-13
6358818 Method for forming trench isolation regions 2002-03-19
6355540 Stress-free shallow trench isolation 2002-03-12
6348390 Method for fabricating MOSFETS with a recessed self-aligned silicide contact and extended source/drain junctions 2002-02-19
6342422 Method for forming MOSFET with an elevated source/drain 2002-01-29
6331456 Fipos method of forming SOI CMOS structure 2001-12-18
6329264 Method for forming a ragged polysilcon crown-shaped capacitor for a memory cell 2001-12-11
6323094 Method to fabricate deep sub-.mu.m CMOSFETs 2001-11-27
6316316 Method of forming high density and low power flash memories with a high capacitive-coupling ratio 2001-11-13
6303417 Method of forming self-aligned planarization twin-well by using fewer mask counts for CMOS transistors 2001-10-16
6294416 Method of fabricating CMOS transistors with self-aligned planarization twin-well by using fewer mask counts 2001-09-25
6294797 MOSFET with an elevated source/drain 2001-09-25