Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7776510 | Resist composition, method of forming resist pattern, compound and acid generator | Hideo Hada, Keita Ishiduka, Akiya Kawaue, Hiroaki Shimizu, Kyoko Ohshita +4 more | 2010-08-17 |
| 7771911 | Process for producing photoresist composition, filter, coater and photoresist composition | Hideo Hada, Masaaki Shimazaki, Masaaki Muroi, Kota Atsuchi, Hiroaki Tomida +1 more | 2010-08-10 |
| 7767377 | Positive type resist composition, process for forming resist pattern, and process for performing ion implantation | Shinichi Kohno, Ryotaro Hayashi | 2010-08-03 |
| 7763412 | Polymer, positive resist composition and method for forming resist pattern | Masaru Takeshita, Hideo Hada, Ryotaro Hayashi, Syogo Matsumaru, Satoshi Fujimura | 2010-07-27 |
| 7745097 | Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Takehiro Seshimo, Akiya Kawaue, Keita Ishiduka | 2010-06-29 |
| 7608381 | Polymer compound, positive resist composition and process for forming resist pattern | Yohei Kinoshita | 2009-10-27 |
| 7575846 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita +1 more | 2009-08-18 |
| 7544460 | Resist composition, multilayer body, and method for forming resist pattern | Hideo Hada, Kazuhito Sasaki, Satoshi Fujimura | 2009-06-09 |
| 7541138 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-06-02 |
| 7534550 | Positive resist composition and process for formation of resist patterns | Hiroaki Shimizu | 2009-05-19 |
| 7527909 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-05-05 |
| 7501221 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2009-03-10 |
| 7501220 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-03-10 |
| 7488568 | Resist composition, method of forming resist pattern, compound and acid generator | Hideo Hada, Masaru Takeshita, Akiya Kawaue, Keita Ishiduka, Hiroaki Shimizu +6 more | 2009-02-10 |
| 7482108 | Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns | Shogo Matsumaru, Masaru Takeshita, Hideo Hada | 2009-01-27 |
| 7435530 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-10-14 |
| 7390612 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-06-24 |
| 7326515 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-02-05 |
| 7323287 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-01-29 |
| 7316888 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-01-08 |
| 7316889 | Positive type resist composition and resist pattern formation method using same | Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada | 2008-01-08 |
| 7316885 | Method of forming resist pattern, positive resist composition, and layered product | Hideo Hada, Miwa Miyairi, Naotaka Kubota | 2008-01-08 |
| 7312015 | Process for refining crude resin for electronic material | Hideo Hada, Masaru Takeshita, Ryotaro Hayashi, Masaaki Muroi, Kota Atsuchi +2 more | 2007-12-25 |
| 7276575 | Process for refining crude resin for resist | Hideo Hada, Miwa Miyairi, Masaaki Muroi, Kota Atsuchi, Hiroaki Tomida | 2007-10-02 |
| 7183368 | Negative-working photoresist composition | Hideo Hada, Satoshi Fujimura | 2007-02-27 |