Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11098193 | (Meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article | Yutaka Aoki, Fumi Ooba, Masahiro Ueda, Shinji Matsuoka, Mitsufumi Nodono | 2021-08-24 |
| 10513606 | (Meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article | Yutaka Aoki, Fumi Ooba, Masahiro Ueda, Shinji Matsuoka, Mitsufumi Nodono | 2019-12-24 |
| 10446850 | Binder resin composition for secondary battery electrodes, slurry for secondary battery electrodes, electrode for secondary batteries, and lithium ion secondary battery | Fumino Momose, Haruki Okada, Ayako Shimonaka, Mitsufumi Nodono, Daisuke Fujikawa +1 more | 2019-10-15 |
| 10361434 | Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery | Haruki Okada, Mitsufumi Nodono, Fumino Momose, Fumiko Fujie, Akikazu Matsumoto +3 more | 2019-07-23 |
| 9774038 | Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery | Haruki Okada, Mitsufumi Nodono, Fumino Momose, Fumiko Fujie, Akikazu Matsumoto +3 more | 2017-09-26 |
| 9733564 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | Atsushi Yasuda, Tomoya Oshikiri | 2017-08-15 |
| 9188857 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | Akifumi Ueda | 2015-11-17 |
| 8614283 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda | 2013-12-24 |
| 8580481 | Resist polymer and resist composition | Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2013-11-12 |
| 8476401 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | Akifumi Ueda | 2013-07-02 |
| 8241829 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda | 2012-08-14 |
| 8092979 | Resist polymer and resist composition | Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2012-01-10 |
| 8049042 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda | 2011-11-01 |
| 7575846 | Resist polymer and resist composition | Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2009-08-18 |
| 7339014 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Koizumi | 2008-03-04 |
| 7316884 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | Ryuichi Ansai, Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake | 2008-01-08 |
| 7041838 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Koizumi | 2006-05-09 |
| 6927011 | Resins for resists and chemically amplifiable resist compositions | Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon | 2005-08-09 |