Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12384863 | Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth)acrylic ester and production method therefor | Kazuaki Mukai, Takeru Jo, Satoshi Sakuma, Ryuichi Ansai | 2025-08-12 |
| 11845822 | Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor | Kazuaki Mukai, Takeru Jo, Satoshi Sakuma, Ryuichi Ansai | 2023-12-19 |
| 11643489 | (Meth)acrylic copolymer, polymer solution, polymer-containing composition, anti-fouling coating composition, and method for producing (meth)acrylic copolymer | Kana Taniguchi, Sho KATSUMATA, Junichi Nakamura, Masatoshi URA, Takafumi ASAI | 2023-05-09 |
| 11639423 | Resin composition, coating composition, and coated article | Riina Kanbara, Takafumi ASAI, Masashi Serizawa, Takahiro Mukuda | 2023-05-02 |
| 11314179 | Polyester resin, method for producing polyester resin, and toner using said polyester resin | Tadahiro Ozawa, Asako Kaneko, Masaaki Kiura | 2022-04-26 |
| 10421705 | Carboxylic acid ester production method | Akihiro Goto, Hiroyuki Mori | 2019-09-24 |
| 10125081 | Method for producing carboxylic acid anhydride and method for producing carboxylic acid ester | Akihiro Goto | 2018-11-13 |
| 7339014 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi | 2008-03-04 |
| 7316884 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | Ryuichi Ansai, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake, Hikaru Momose | 2008-01-08 |
| 7041838 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi | 2006-05-09 |
| 6927011 | Resins for resists and chemically amplifiable resist compositions | Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Hikaru Momose | 2005-08-09 |