Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8580481 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Masaru Takeshita, Ryotaro Hayashi +1 more | 2013-11-12 |
| 8092979 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Masaru Takeshita, Ryotaro Hayashi +1 more | 2012-01-10 |
| 7702486 | Apparatus and method for managing liquid crystal substrate | Chikuya Takada | 2010-04-20 |
| 7575846 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Masaru Takeshita, Ryotaro Hayashi +1 more | 2009-08-18 |
| 7339014 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | Yoshihiro Kamon, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi | 2008-03-04 |
| 7316884 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | Ryuichi Ansai, Yoshihiro Kamon, Hideaki Kuwano, Atsushi Ootake, Hikaru Momose | 2008-01-08 |
| 7041838 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | Yoshihiro Kamon, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi | 2006-05-09 |
| 6927011 | Resins for resists and chemically amplifiable resist compositions | Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose | 2005-08-09 |
| 6887646 | Chemical amplification resist composition | Yukiya Wakisaka, Masayuki Tooyama | 2005-05-03 |
| 6844559 | Apparatus and method for testing substrate | — | 2005-01-18 |
| 6706826 | Copolymer, process for producing the same, and resist composition | Masayuki Tooyama, Yukiya Wakisaka, Koji Nishida, Akira Yanagase | 2004-03-16 |
| 6630246 | Photocurable sheet, moldings thereof, and processes for producing the same | Akira Yanagase, Yoko Kakuno, Yukiya Wakisaka | 2003-10-07 |
| 5878106 | X-ray diffractometer | — | 1999-03-02 |
| 5376500 | Polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using the polyester resin | Kenji Kushi, Takayuki Iseki, Kazuhiko Jufuku, Akifumi Ueda, Hitoshi Iwasaki +1 more | 1994-12-27 |
| 5326741 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Takayuki Iseki, Kazuhiko Jufuku, Akifumi Ueda | 1994-07-05 |
| 5326742 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Takayuki Iseki, Kazuhiko Jufuku, Akifumi Ueda | 1994-07-05 |
| 5290750 | Recording media for a sublimation-type heat-sensitive recording process | Kenji Kushi, Takayuki Iseki, Kazuhiko Jufuku | 1994-03-01 |
| 5286707 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Takayuki Iseki, Kazuhiko Jufuku | 1994-02-15 |
| 5218019 | Sublimation disperson dye receptive resin compositions | Kenji Kushi | 1993-06-08 |
| 5096877 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Hideyasu Ryoke, Kazuhiko Jufuku, Susumu Kondo | 1992-03-17 |