Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9625812 | Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same | Hidetaka Nakagawara, Shintaro Okada, Saki Fujita, Kazuo Watanabe, Shigeki Watanabe | 2017-04-18 |
| 9188857 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | Hikaru Momose | 2015-11-17 |
| 8647806 | Photosensitive resin composition, photosensitive dry film and method for forming pattern | Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Wei Jen Lan, Chao Lin | 2014-02-11 |
| 8647807 | Photosensitive resin composition, photosensitive dry film and method for forming pattern | Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Wei Jen Lan, Chao Lin | 2014-02-11 |
| 8614283 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Hikaru Momose, Atsushi Ootake, Tadashi Nakamura | 2013-12-24 |
| 8580481 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2013-11-12 |
| 8476401 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | Hikaru Momose | 2013-07-02 |
| 8241829 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Hikaru Momose, Atsushi Ootake, Tadashi Nakamura | 2012-08-14 |
| 8092979 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2012-01-10 |
| 8049042 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Hikaru Momose, Atsushi Ootake, Tadashi Nakamura | 2011-11-01 |
| 7575846 | Resist polymer and resist composition | Hikaru Momose, Atsushi Ootake, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi +1 more | 2009-08-18 |
| 5376500 | Polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using the polyester resin | Kenji Kushi, Takayuki Iseki, Tadayuki Fujiwara, Kazuhiko Jufuku, Hitoshi Iwasaki +1 more | 1994-12-27 |
| 5326741 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Takayuki Iseki, Tadayuki Fujiwara, Kazuhiko Jufuku | 1994-07-05 |
| 5326742 | Recording medium for sublimation type heat-sensitive transfer recording process | Kenji Kushi, Takayuki Iseki, Tadayuki Fujiwara, Kazuhiko Jufuku | 1994-07-05 |