Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8137471 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +6 more | 2012-03-20 |
| 7993487 | Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma | — | 2011-08-09 |
| 7988816 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2011-08-02 |
| 7951262 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +10 more | 2011-05-31 |
| 7915900 | Measuring system | — | 2011-03-29 |
| 7758929 | Plasma processing apparatus and method | Noriaki Imai | 2010-07-20 |
| 7740737 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +6 more | 2010-06-22 |
| 7737706 | Method and apparatus for inspecting process performance for use in a plasma processing apparatus | — | 2010-06-15 |
| 7712436 | Plasma processing apparatus with filter circuit | — | 2010-05-11 |
| 7655110 | Plasma processing apparatus | — | 2010-02-02 |
| 7611603 | Plasma processing apparatus having impedance varying electrodes | — | 2009-11-03 |
| 7582182 | Method and apparatus for measuring electron density of plasma and plasma processing apparatus | Naoki Matsumoto, Chishio Koshimizu, Tatsuo Matsudo, Sumie Segawa | 2009-09-01 |
| 7527016 | Plasma processing apparatus | Manabu Iwata, Chishio Koshimizu, Fumihiko Higuchi, Akitaka Shimizu, Asao Yamashita +5 more | 2009-05-05 |
| 7462293 | Method and apparatus for measuring electron density of plasma and plasma processing apparatus | Naoki Matsumoto, Chishio Koshimizu | 2008-12-09 |
| 7432467 | Plasma processing apparatus | — | 2008-10-07 |
| 7415940 | Plasma processor | Chishio Koshimizu | 2008-08-26 |
| 7339656 | Method and apparatus for measuring electron density of plasma and plasma processing apparatus | Naoki Matsumoto, Chishio Koshimizu, Tatsuo Matsudo, Sumie Segawa | 2008-03-04 |
| 6448094 | Method of detecting etching depth | Yoshihito Ookawa | 2002-09-10 |