MO

Mitsuhiro Okada

TL Tokyo Electron Limited: 52 patents #50 of 5,567Top 1%
AD Adeka: 12 patents #17 of 499Top 4%
HI Hitachi: 12 patents #3,472 of 28,497Top 15%
MI Mitsuba: 10 patents #21 of 618Top 4%
AC Alps Electric Co.: 4 patents #470 of 2,177Top 25%
HM Hitachi Maxell: 3 patents #330 of 1,211Top 30%
SC Sumitomo Chemical: 3 patents #1,386 of 4,033Top 35%
MA Maxell: 2 patents #227 of 437Top 55%
SC Sanyo Electric Co.: 2 patents #2,557 of 6,347Top 45%
Yamaha Motor: 1 patents #1,283 of 2,310Top 60%
YA Yazaki: 1 patents #2,077 of 3,427Top 65%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
MM Minebea Mitsumi: 1 patents #239 of 442Top 55%
HC Hitachi Consumer Electronics Co.: 1 patents #206 of 447Top 50%
NI Nitta: 1 patents #106 of 237Top 45%
TT The Ritsumeikan Trust: 1 patents #34 of 141Top 25%
Overall (All Time): #12,390 of 4,157,543Top 1%
108
Patents All Time

Issued Patents All Time

Showing 76–100 of 108 patents

Patent #TitleCo-InventorsDate
8455369 Trench embedding method Masahisa Watanabe 2013-06-04
8350054 Optical filter Yukiko Mae 2013-01-08
8343594 Film formation method and apparatus for semiconductor process Kazuhide Hasebe, Chaeho Kim, Byounghoon Lee, Pao-Hwa Chou 2013-01-01
8222162 Batch processing method for forming structure including amorphous carbon film Yukio Tojo 2012-07-17
8184700 Image decoder Hironori Komi, Yusuke Yatabe, Keisuke Inata 2012-05-22
8105970 Olefin polymerization catalyst component and production process thereof, and production proces of olefin polymerization catalyst and olefin polymer Wataru Hirahata 2012-01-31
8080109 Film formation apparatus and method for using the same Satoshi Takagi, Ryou Son, Masahiko Tomita, Yamato Tonegawa, Toshiharu Nishimura 2011-12-20
7964516 Film formation apparatus for semiconductor process and method for using same Yamato Tonegawa 2011-06-21
7959737 Film formation apparatus and method for using the same Satoshi MIZUNAGA, Yamato Tonegawa, Toshiharu Nishimura 2011-06-14
7923357 Method for forming poly-silicon film Takahiro Miyahara, Toshiharu Nishimura 2011-04-12
D620085 Gas supply pipe for manufacturing semiconductor wafers 2010-07-20
7758920 Method and apparatus for forming silicon-containing insulating film Kazuhide Hasebe, Pao-Hwa Chou, Jun Ogawa, Chaeho Kim, Kohei Fukushima +2 more 2010-07-20
7713354 Film forming method, film forming system and recording medium Kazuhide Hasebe 2010-05-11
7696106 Film formation method and apparatus for semiconductor process Kazumi Kubo 2010-04-13
7691445 Film formation apparatus and method of using the same Toshiharu Nishimura 2010-04-06
7682773 Cyanine compound, optical recording material using the same and optical recording medium Toru Yano, Koichi Shigeno 2010-03-23
7611995 Method for removing silicon oxide film and processing apparatus Kazuhide Hasebe, Takashi Chiba, Jun Ogawa 2009-11-03
7575270 Opening/closing apparatus for vehicle Kei Nagai 2009-08-18
7553604 Cyanine compound, optical recording material, and optical recording medium Toru Yano, Koichi Shigeno 2009-06-30
7520937 Thin film forming apparatus and method of cleaning the same Kazuhide Hasebe, Hiromichi Kotsugai 2009-04-21
D588079 Heat dissipation deterrence link for semiconductor manufacture Yoshikazu Furusawa, Daisuke Suzuki 2009-03-10
D588078 Heat dissipation deterrence link for semiconductor manufacture Yoshikazu Furusawa, Daisuke Suzuki 2009-03-10
7470637 Film formation apparatus and method of using the same Toshiharu Nishimura, Atsushi Endo 2008-12-30
7462571 Film formation method and apparatus for semiconductor process for forming a silicon nitride film Kazuhide Hasebe, Pao-Hwa Chou, Chaeho Kim, Jun Ogawa 2008-12-09
7427572 Method and apparatus for forming silicon nitride film Kazuhide Hasebe 2008-09-23