| 12002846 |
Integrated circuits having dielectric layers including an anti-reflective coating |
Poornika Fernandes, David M. Curran, Stephen Arlon Meisner, Bhaskar Srinivasan, Guruvayurappan Mathur +3 more |
2024-06-04 |
$36,059,000 |
| 11605587 |
Methods for etching metal interconnect layers |
Poornika Fernandes, Bhaskar Srinivasan, Guruvayurappan Mathur |
2023-03-14 |
$53,908,000 |
| 11522043 |
IC with matched thin film resistors |
Tae Seung Kim, Steven Lee Prins, Can Duan, Abbas Ali, Erich Wesley Kinder |
2022-12-06 |
$49,269,000 |
| 11171200 |
Integrated circuits having dielectric layers including an anti-reflective coating |
Poornika Fernandes, David M. Curran, Stephen Arion Meisner, Bhaskar Srinivasan, Guruvayurappan Mathur +3 more |
2021-11-09 |
$35,109,000 |
| 10756095 |
SRAM cell with T-shaped contact |
Theodore W. Houston, Thomas J. Aton |
2020-08-25 |
$38,679,000 |
| 10748913 |
SRAM cell with T-shaped contact |
Theodore W. Houston, Thomas J. Aton |
2020-08-18 |
$31,996,000 |
| 10566200 |
Method of fabricating transistors, including ambient oxidizing after etchings into barrier layers and anti-reflecting coatings |
Abbas Ali, Binghua Hu, Stephanie L. Hilbun, Ronald Chin, Jarvis Benjamin Jacobs |
2020-02-18 |
$34,774,000 |
| 10199380 |
SRAM cell with T-shaped contact |
Theodore W. Houston, Thomas J. Aton |
2019-02-05 |
$20,780,000 |
| 10163911 |
SRAM cell with T-shaped contact |
Theodore W. Houston, Thomas J. Aton |
2018-12-25 |
|
| 10103171 |
Metal on elongated contacts |
James Walter Blatchford |
2018-10-16 |
$19,080,000 |
| 10043714 |
Elongated contacts using litho-freeze-litho-etch process |
James Walter Blatchford |
2018-08-07 |
$32,602,000 |
| 9620419 |
Elongated contacts using litho-freeze-litho-etch process |
James Walter Blatchford |
2017-04-11 |
$14,039,000 |
| 9343332 |
Alignment to multiple layers |
Thomas J. Aton, Steven Lee Prins |
2016-05-17 |
$10,762,000 |
| 9312170 |
Metal on elongated contacts |
James Walter Blatchford |
2016-04-12 |
$17,054,000 |
| 9305848 |
Elongated contacts using litho-freeze-litho-etch process |
James Walter Blatchford |
2016-04-05 |
$12,005,000 |
| 9117775 |
Alignment to multiple layers |
Thomas J. Aton, Steven Lee Prins |
2015-08-25 |
$11,197,000 |
| 9054214 |
Methodology of forming CMOS gates on the secondary axis using double-patterning technique |
Gregory Charles Baldwin |
2015-06-09 |
$10,012,000 |
| 9024450 |
Two-track cross-connect in double-patterned structure using rectangular via |
James Walter Blatchford |
2015-05-05 |
$16,301,000 |
| 8580675 |
Two-track cross-connect in double-patterned structure using rectangular via |
James Walter Blatchford |
2013-11-12 |
$7,244,000 |
| 7987436 |
Sub-resolution assist feature to improve symmetry for contact hole lithography |
Mark Terry, Robert Soper |
2011-07-26 |
$16,775,000 |
| 7745067 |
Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirements |
James Walter Blatchford |
2010-06-29 |
$5,601,000 |
| 7512928 |
Sub-resolution assist feature to improve symmetry for contact hole lithography |
Mark Terry, Robert Soper |
2009-03-31 |
$10,408,000 |
| 7461367 |
Modifying merged sub-resolution assist features of a photolithographic mask |
Sean O'Brien |
2008-12-02 |
$7,156,000 |
| 7425502 |
Minimizing resist poisoning in the manufacture of semiconductor devices |
Zhijian Lu, Thomas Wolf |
2008-09-16 |
$20,227,000 |
| 7262129 |
Minimizing resist poisoning in the manufacture of semiconductor devices |
Zhijian Lu, Thomas Wolf |
2007-08-28 |
$14,951,000 |