TW

Thomas Wolf

IK Iwis Antriebssysteme Gmbh & Co. Kg: 5 patents #2 of 18Top 15%
AT AT&T: 3 patents #5,550 of 18,772Top 30%
AS Agere Systems: 3 patents #475 of 1,849Top 30%
TI Texas Instruments: 2 patents #5,248 of 12,488Top 45%
TK Trumpf Werkzeugmaschinen Gmbh + Co. Kg: 1 patents #116 of 253Top 50%
📍 Petersberg, OH: #1 of 1 inventorsTop 100%
Overall (All Time): #261,728 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
12203749 Chain elongation monitoring device and method for determining wear Josef Siraky 2025-01-21
11524848 Apparatus and method for determining the wear condition of a chain Peter Kreisfeld, Florian Madlener, Josef Siraky 2022-12-13
11518622 Apparatus and method for determining the wear condition of a chain Peter Kreisfeld, Florian Madlener, Josef Siraky 2022-12-06
11454304 Actuator comprising anti-backbend chain Florian Madlener, Joel Tchaweu Tchatchoua 2022-09-27
11248684 Actuator with an anti-backbend chain Joel Tchaweu Tchatchoua, Orhan Sahin, Frank Rasch, Abhijit Potdar, Toralf Teuber +1 more 2022-02-15
10801862 Device and method for determining the wear state of a chain Peter Kreisfeld, Florian Madlener, Josef Siraky 2020-10-13
9229444 Numerical control (NC) program and process for simplified reproduction on a machine tool Monika Baierl-Moehler, Klaus Bauer, Sascha Brandt, Mirko Donatzer, Goetz Nothdurft +1 more 2016-01-05
8393200 Device and method for measuring mechanical properties of materials Bernhard Scherzinger, Hans-Peter Vollmar 2013-03-12
7425502 Minimizing resist poisoning in the manufacture of semiconductor devices Zhijian Lu, Scott Jessen 2008-09-16
7262129 Minimizing resist poisoning in the manufacture of semiconductor devices Zhijian Lu, Scott Jessen 2007-08-28
7160799 Define via in dual damascene process Steven Alan Lytle, Allen Yen 2007-01-09
6985229 Overlay metrology using scatterometry profiling Cynthia C. Lee, Stephen Arlon Meisner, Alberto Santoni, John M. McIntosh 2006-01-10
6559062 Method for avoiding notching in a semiconductor interconnect during a metal etching step Stephen W. Downey, Allen Yen, Paul B. Murphey 2003-05-06
5780316 Linewidth control apparatus and method Hongzong Chew, John David Cuthbert, Hamlet Herring, John Louis Ryan, Robert Ching-I Sun +1 more 1998-07-14
5215867 Method with gas functionalized plasma developed layer Larry E. Stillwagon, Gary N. Taylor, Thirumalai Venkatesan 1993-06-01
5057462 Compensation of lithographic and etch proximity effects Juli H. Eisenberg, Larry Bruce Fritzinger, Chong-Cheng Fu, Taeho Kook 1991-10-15
4757056 Method for tumor regression in rats, mice and hamsters using hexuronyl hexosaminoglycan-containing compositions Cornelius L. Van Gorp 1988-07-12