| 7972440 |
Monitoring and control of a fabrication process |
Erik Cho Houge, Robert Jones |
2011-07-05 |
| D536522 |
Wrist/hand worn mirror |
— |
2007-02-13 |
| 6985229 |
Overlay metrology using scatterometry profiling |
Cynthia C. Lee, Stephen Arlon Meisner, Thomas Wolf, Alberto Santoni |
2006-01-10 |
| 6893800 |
Substrate topography compensation at mask design: 3D OPC topography anchored |
Scott Jessen, Scott M. Nagel |
2005-05-17 |
| 6750447 |
Calibration standard for high resolution electron microscopy |
Erik Cho Houge, Catherine Vartuli, Fred Stevie |
2004-06-15 |
| 6727720 |
Probe having a microstylet |
Erik Cho Houge, Ryan Maynard, Larry E. Plew, Jeffrey B. Bindell |
2004-04-27 |
| 6714892 |
Three dimensional reconstruction metrology |
Erik Cho Houge, Larry E. Plew |
2004-03-30 |
| 6708574 |
Abnormal photoresist line/space profile detection through signal processing of metrology waveform |
Erik Cho Houge, Scott Jessen, Catherine Vartuli, Fred Stevie |
2004-03-23 |
| 6651226 |
Process control using three dimensional reconstruction metrology |
Erik Cho Houge, Larry E. Plew |
2003-11-18 |
| 6641746 |
Control of semiconductor processing |
Erik Cho Houge, Edward Alios Rietman |
2003-11-04 |
| 6633032 |
Mass spectrometer particle counter |
Erik Cho Houge, Fred Stevie, Steven Barry Valle, Catherine Vartuli |
2003-10-14 |
| 6627885 |
Method of focused ion beam pattern transfer using a smart dynamic template |
Erik Cho Houge, Fred Stevie, Catherine Vartuli, Scott Jessen |
2003-09-30 |
| 6606371 |
X-ray system |
Michael J. Antonell, Erik Cho Houge, Larry E. Plew, Catherine Vartuli |
2003-08-12 |
| 6577970 |
Method of determining a crystallographic quality of a material located on a substrate |
Erik Cho Houge, Larry E. Plew, Fred Stevie, Catherine Vartuli |
2003-06-10 |
| 6569690 |
Monitoring system for determining progress in a fabrication activity |
Erik Cho Houge, Isik C. Kizilyalli, Fred Stevie, Catherine Vartuli |
2003-05-27 |
| 6556703 |
Scanning electron microscope system and method of manufacturing an integrated circuit |
Brittin Kane |
2003-04-29 |
| 6369891 |
Method of determining accuracy error in line width metrology device |
Brittin Kane |
2002-04-09 |
| 6326618 |
Method of analyzing semiconductor surface with patterned feature using line width metrology |
Brittin Kane |
2001-12-04 |
| 6265235 |
Method of sectioning of photoresist for shape evaluation |
Erik Cho Houge, Brittin Kane, Simon John Molloy, Catherine Vartuli |
2001-07-24 |
| 6258610 |
Method analyzing a semiconductor surface using line width metrology with auto-correlation operation |
James Walter Blatchford, Scott Jessen, Brittin Kane, Nace Layadi, Simon John Molloy |
2001-07-10 |
| 6225639 |
Method of monitoring a patterned transfer process using line width metrology |
Thomas E. Adams, Thomas S. Frederick, Scott Jessen, Catherine Vartuli |
2001-05-01 |
| 6097484 |
Location of defects using dye penetration |
Brittin Kane, Annette M. Crevasse, Todd Henry |
2000-08-01 |