Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12064846 | Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith | Bryan E. Barton, Teresa Brugarolas Brufau, Vere O. Archibald, Michael E. Mills | 2024-08-20 |
| 6750145 | Method of eliminating agglomerate particles in a polishing slurry | William Easter, John A. Maze, Sailesh Mansinh Merchant, Frank Miceli | 2004-06-15 |
| 6730603 | System and method of determining a polishing endpoint by monitoring signal intensity | William Easter, Frank Miceli, Yifeng Yang | 2004-05-04 |
| 6726537 | Polishing carrier head | William Easter, John A. Maze, Frank Miceli | 2004-04-27 |
| 6615433 | Apparatus for detecting wetness of a semiconductor wafer cleaning brush | William Easter, John A. Maze, Frank Miceli | 2003-09-09 |
| 6579797 | Cleaning brush conditioning apparatus | William Easter, John A. Maze, Frank Miceli | 2003-06-17 |
| 6558238 | Apparatus and method for reclamation of used polishing slurry | William Easter, John A. Maze, Frank Miceli | 2003-05-06 |
| 6551410 | Method of cleaning a semiconductor wafer with a cleaning brush assembly having a contractible and expandable arbor | William Easter, John A. Maze, Frank Miceli | 2003-04-22 |
| 6518987 | Mouse and mouse template for a motion impaired user | William Easter, John A. Maze, Frank Miceli | 2003-02-11 |
| 6517416 | Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher | William Easter, John A. Maze, Frank Miceli | 2003-02-11 |
| 6514123 | Semiconductor polishing pad alignment device for a polishing apparatus and method of use | William Easter, John A. Maze, Frank Miceli | 2003-02-04 |
| 6508363 | Slurry container | William Easter, John A. Maze, Frank Miceli | 2003-01-21 |
| 6462305 | Method of manufacturing a polishing pad using a beam | William Easter, Frank Miceli | 2002-10-08 |
| 6423149 | Apparatus and method for gradient cleaning of semiconductor wafers | William Easter, John A. Maze, Frank Miceli | 2002-07-23 |
| 6402599 | Slurry recirculation system for reduced slurry drying | William Easter, John A. Maze, Frank Miceli, Craig R. Zavilla | 2002-06-11 |
| 6354928 | Polishing apparatus with carrier ring and carrier head employing like polarities | William Easter, John A. Maze, Frank Miceli | 2002-03-12 |
| 6355184 | Method of eliminating agglomerate particles in a polishing slurry | William Easter, John A. Maze, Sailesh Mansinh Merchant, Frank Miceli | 2002-03-12 |
| 6290883 | Method for making porous CMP article | William Easter, John A. Maze, Frank Miceli | 2001-09-18 |
| 6287173 | Longer lifetime warm-up wafers for polishing systems | William Easter, Alvaro Maury, John A. Maze, Frank Miceli | 2001-09-11 |
| 6264536 | Reducing polish platen corrosion during integrated circuit fabrication | William Easter, John A. Maze, Sailesh Mansinh Merchant, Frank Miceli | 2001-07-24 |
| 6261958 | Method for performing chemical-mechanical polishing | Alvaro Maury, Sanjay Patel, John Thomas Sowell | 2001-07-17 |
| 6206976 | Deposition apparatus and related method with controllable edge exclusion | Adrienne Gould-Choquette | 2001-03-27 |
| 6183652 | Method for removing microorganism contamination from a polishing slurry | William Easter, John A. Maze, Frank Miceli | 2001-02-06 |
| 6121142 | Magnetic frictionless gimbal for a polishing apparatus | William Easter, John A. Maze | 2000-09-19 |
| 6097484 | Location of defects using dye penetration | John M. McIntosh, Brittin Kane, Todd Henry | 2000-08-01 |