BB

Bryan E. Barton

RH Rohm And Haas Electronic Materials Cmp Holdings: 6 patents #46 of 239Top 20%
Dow Global Technologies: 3 patents #1,458 of 4,534Top 35%
RM Rohm And Haas Electronic Materials: 1 patents #369 of 562Top 70%
🗺 Michigan: #9,426 of 86,293 inventorsTop 15%
Overall (All Time): #491,512 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
12064845 Formulations for chemical mechanical polishing pads with high planarization efficiency and CMP pads made therewith Teresa Brugarolas Brufau 2024-08-20
12064846 Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith Annette M. Crevasse, Teresa Brugarolas Brufau, Vere O. Archibald, Michael E. Mills 2024-08-20
11833638 CMP polishing pad with polishing elements on supports John R. McCormick 2023-12-05
11813713 Chemical mechanical polishing pad and polishing method Teresa Brugarolas Brufau 2023-11-14
11806830 Formulations for chemical mechanical polishing pads and CMP pads made therewith Teresa Brugarolas Brufau 2023-11-07
11772230 Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith Jing-Fei Ren, Kwadwo E. Tettey 2023-10-03
10208154 Formulations for chemical mechanical polishing pads and CMP pads made therewith Michael E. Mills 2019-02-19
9816207 Two-step sulfonation process for the conversion of polymer fibers to carbon fibers Jasson T. Patton, Eric J. Hukkanen, Mark T. Bernius 2017-11-14
9228276 Processes for preparing carbon fibers using gaseous sulfur trioxide Zenon Lysenko, Mark T. Bernius, Eric J. Hukkanen 2016-01-05
9222201 Processes for preparing carbon fibers using sulfur trioxide in a halogenated solvent Jasson T. Patton, Mark T. Bernius, Xiaoyun Chen, Eric J. Hukkanen, Christina A. Rhoton +1 more 2015-12-29