Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11772230 | Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith | Jing-Fei Ren, Bryan E. Barton | 2023-10-03 |
| 10954411 | Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide | Naresh Kumar Penta, Matthew Van Hanehem | 2021-03-23 |
| 10822524 | Aqueous compositions of low dishing silica particles for polysilicon polishing | Naresh Kumar Penta, Matthew Van Hanehem, Koichi Yoshida, Kyohei Yoshida | 2020-11-03 |
| 10787592 | Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment | Naresh Kumar Penta, Matthew Van Hanehem | 2020-09-29 |
| 10626298 | Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon | Naresh Kumar Penta, Matthew Van Hanehem | 2020-04-21 |
| 10584265 | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them | Naresh Kumar Penta, Yi Guo, David Mosley, Matthew Van Hanehem | 2020-03-10 |