Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11292938 | Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films | Murali G. Theivanayagam, Yi Guo | 2022-04-05 |
| 10954411 | Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide | Naresh Kumar Penta, Kwadwo E. Tettey | 2021-03-23 |
| 10822524 | Aqueous compositions of low dishing silica particles for polysilicon polishing | Naresh Kumar Penta, Kwadwo E. Tettey, Koichi Yoshida, Kyohei Yoshida | 2020-11-03 |
| 10787592 | Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment | Naresh Kumar Penta, Kwadwo E. Tettey | 2020-09-29 |
| 10626298 | Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon | Naresh Kumar Penta, Kwadwo E. Tettey | 2020-04-21 |
| 10584265 | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them | Naresh Kumar Penta, Yi Guo, David Mosley, Kwadwo E. Tettey | 2020-03-10 |
| 10377921 | Chemical mechanical polishing method for cobalt | Murali G. Theivanayagam, Hongyu Wang | 2019-08-13 |
| 10316218 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Naresh Kumar Penta, Julia Kozhukh, David Mosley, Kancharla-Arun Kumar Reddy | 2019-06-11 |
| 10221336 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Julia Kozhukh, David Mosley, Naresh Kumar Penta, Kancharla-Arun Kumar Reddy | 2019-03-05 |
| 10170335 | Chemical mechanical polishing method for cobalt | Murali G. Theivanayagam, Hongyu Wang | 2019-01-01 |
| 9783702 | Aqueous compositions of low abrasive silica particles | Yi Guo, David Mosley | 2017-10-10 |
| 9102034 | Method of chemical mechanical polishing a substrate | Michelle Jensen, Bainian Qian, Fengji Yeh, Marty W. DeGroot, Mohammad T. Islam +4 more | 2015-08-11 |